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Plasma treatment helps reveal how molecular coatings dope silicon

来源: Phys.org · 发布于

Plasma treatment helps reveal how molecular coatings dope silicon

Controlling dopant concentration near the silicon surface is increasingly important for ultrashallow junctions and nanoscale devices. Mixed monolayer doping (MMLD) offers a surface-chemistry-based…

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  • #silicon
  • #surface
  • #concentration
  • #increasingly
  • #ultrashallow
  • #controlling

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